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  • Perovskite UV Light Cleaner Machine For Small Substrate Cleaning ITO FTO

    • Perovskite UV Light Cleaner Machine For Small Substrate Cleaning ITO FTO

    • Model Number:

      TMAX-BZS

    • Warranty:

      Two Year Limited Warranty With Lifetime Support

    • Payment:

      T/T, Credit Card, Paypal, LC, Western Union

    • Delivery Time:

      3 Days
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    Email:David@battery-equipments.com
    Wechat:13506084915
    DESCRIPTION

    Perovskite UV Light Cleaner Machine For Small Substrate Cleaning ITO FTO




    UV light cleaning machine BZS250GF-TC has industrial level cleaning efficiency and effect, suitable for small substrate cleaning, such as liquid crystal panel, ITO, FTO, optical glass, OLED, LCD, silicon, ceramic, metal sheet, polymer, silicone and other surface cleaning, for cleaning the surface organic matter of the product, that is, surface modification. Thus better hydrophilicity is obtained.



    A. Product configuration

    Serial number

    Description

    Model number

    BZS200GF-TC

    BZS250GF-TC

    BZS320GF-TC

    1

    Material of complete machine

    The whole machine is made of mirror stainless steel 304, and the key components are made of Schneider, Omron and other brands

    2

    Power supply

    220V,250W

    220V,300W

    220V,350W

    3

    Lamp power

    200W

    250W

    320W

    4

    Cleaning size

    150*150mm

    200*200mm

    250*250mm

    5

    Lamp material technology

    Japanese pure quartz material, one shape grille lamp

    6

    Operating spectrum

    185+254nm

    7

    Lamp life

    8000 hours

    8

    Time frame

    0-99 minutes/hour

    9

    Irradiation height

    0-100mm

    10

    Light assist

    High performance reflector

    11

    Heating (optional)

    Heating range from room temperature to 300℃

    12

    Safety protection

    The lamp goes out automatically when the drawer is pulled out

    13

    Cue light

    Exception indication/alert

    14

    Exhaust function

    With ozone exhaust system, 125mm diameter outlet, equipped with air pipes and fasteners

    15

    Overall dimension

    350W*400L*350H (mm)

    450L*390W*350H (mm)

    16

    Weight

    20kg

    22kg



    B. Application field

    ■ Clean the substrate prior to film deposition. Scum removal and stabilization of photoresist treatment. Ultra-high vacuum seal.

    ■ Clean silicon chips, lenses, mirrors, solar panels, cold rolled steel, inertial guidance parts and GaAs chips

    ■ Clean flux, mixing circuit and flat panel LCD display

    ■ Etch Teflon, fluororubbers and other organic materials

    ■ Enhanced GaAs and Si oxide passivation surface

    ■ Enhance the degassing effect of glass

    ■ Substrate blue film removal

    ■ Enhance the adhesion of the coating on the plastic surface

    ■ Clear ink stain after final test of substrate

    ■ Remove photoresist

    ■ Flat panel display/LCD display

    ■ Remove residuals from the lithographic machine

    ■ Clean the circuit board before packaging and taping)

    ■ Optical fiber

    ■ Enhanced surface hydrophilic properties

    ■ Cleaning and disinfection for bioscience applications

    ■ Optical lens

    ■ Other applications

     

    C. Cleaning effect

    The cleaning effect is generally tested by the substrate surface hydrophilicity, that is, the contact Angle

      


     

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    Related Tags :

    Cleaning Machine ITO Cleaning Machine UV Light Cleaning Machine
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